Tencor™ Stylus Profilometers
Tencor™ Stylus Profilometers
KLA Instruments™ Alpha-Step®, Tencor P- and HRP®-series stylus profilometers deliver high-precision, 2D and 3D surface metrology, measuring step height, surface roughness, bow and stress with industry-leading stability and reliability for your R&D and production requirements.
Timeline of Innovation
Since the launch of the Alpha-Step 100 stylus profilometer in 1977, our technical experts have continued to bring key innovations such as advanced topography sensors, ultra-flat scanning stages and fully automated measurement capability to market. Our tools continue to evolve, providing repeatable and accurate measurements for your surface metrology requirements.
Alpha-Step® D-500
The Alpha-Step D-500 is an affordable, easy-to-use benchtop stylus profiler with a manual X-Y stage for 2D step height and surface roughness measurements for both lab and production environments.
Alpha-Step® D-600
The Alpha-Step D-600 adds a motorized X-Y stage to the Alpha-Step technology, enabling automated mapping of 2D and 3D step height and surface roughness measurements.
Tencor P-7
The Tencor P-7 leverages the industry-leading topography sensor and ultra-flat scanning technology of the Tencor P-17 in a platform that offers the best price to performance for a benchtop stylus profiler.
Tencor P-17 & P-17 OF
The industry-leading Tencor P-17 is the latest generation benchtop stylus profiler built on over 40 years of surface metrology experience, providing precise 2D and 3D step height and surface roughness measurements for R&D and production environments.
Tencor P-170
The Tencor P-170 enables fully automated measurements for the compound semiconductor industry, supporting cassette-to-cassette wafer handling including silicon, sapphire, silicon carbide, gallium arsenide, glass and more.
HRP®-260
Built for high throughput and the reliability required in a production environment, the HRP-260 stylus profilometer combines high resolution, long scan capability and cassette-to-cassette wafer handling.
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With careful attention to instrumentation and software, nanoindentation experiments can be accomplished at a rate faster than one second per indent. High-speed indentation opens new doors for statistical analysis and mechanical-properties
| Event Date | August 12, 2020 |
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