Thin-Film Measurement Systems

Thin-Film Measurement Systems

The Filmetrics® range of affordable reflectometers deliver high-precision film thickness measurements in seconds. These easy-to-use tools, combined with intelligent software and a broad range of accessories and configurations, provide maximum versatility in film thickness measurements ranging from 1nm to 3mm.

Timeline of Innovation

Starting with the launch of the first thin-film measurement instrument in 1995, Filmetrics technical experts have continued to produce key innovations such as AutoBaseline, pattern recognition using the film thickness image, and built-in automatic wavelength calibration. For over two decades, the innovative technology and unparalleled application support offered by Filmetrics has provided customers with repeatable and trustworthy measurements for thin-film metrology. Learn more about the rich history of innovation and see why Filmetrics reflectometers are the standard in thin-film measurement.

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Filmetrics F10-AR

Designed for simple, affordable measurement of ophthalmic anti-reflection coatings and hardcoat thickness measurements.

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Filmetrics F10-ARc

Portable reflectometer with internal fiber optics to measure anti-reflection coatings with a patented long-life, low-power light source.

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Filmetrics F10-HC

Relied on by automotive hardcoat companies around the world to measure hardcoat thickness on flat and curved surfaces.

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Filmetrics F10-RT

Performs simultaneous measurement of reflectance and transmittance; supports calculations of film thickness and refractive index.

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Filmetrics F20

Versatile, affordable general-purpose film thickness and refractive index measurement system.

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Filmetrics F3-sX

Utilizes near infra-red (NIR) light for the measurement of semiconducting and dielectric layers up to 3mm thick.

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Filmetrics F3-CS

Small, portable tool designed for the measurement of coating thickness on small witness samples, such as parylene-coated coupons.

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Filmetrics F30

Provides in situ, real-time measurement of deposition rate, film thickness, and optical constants (n and k) for the analysis of film uniformity and composition of semiconductor and dielectric layers.

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Filmetrics F32

Measures deposition rate, film thickness, optical constants and uniformity in real time, with the capability to measure up to 4 spots simultaneously.

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Filmetrics F40

Includes an integrated live video camera, coupled with microscope optics to produce a measurement spot size as small as 1µm, for the measurement of patterned, curved, and non-uniform samples.

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Filmetrics F50

Uses an automated R-Theta stage for rapid, automatic film thickness mapping of wafer sizes up to 300mm as quickly as 0.5 seconds per site.

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Filmetrics F54

Combines the small measurement spot size of the F40 with an integrated camera, plus automatic mapping of wafers up to 300mm in diameter, using an R-Theta stage.

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Filmetrics F60-t

Brings film thickness and index measurement to a production environment with automatic notch finding, automatic on-board baselining, and SECS/GEM factory automation software.

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Looking for ellipsometer thin-film thickness tools for semiconductor chip manufacturing?

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