Process Control at the Source


Five new systems support patterning control for advanced IC manufacturing

KLA-Tencor’s advanced patterning control systems help IC manufacturers achieve the strict process tolerances required at the sub-7nm logic and leading-edge memory design nodes. Our five new systems are key components in a broad portfolio of metrology, inspection and analysis systems – built on an open architecture – that supports identification and control of patterning variations at the source.

ATL™

Scatterometry-based overlay metrology system with unique tunable laser technology for highly accurate and robust overlay error measurements in production

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SpectraFilm™ F1

Films metrology system with multiple optical technologies for high precision film thickness and bandgap measurements on advanced film stacks

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5D Analyzer® X1

Advanced data analysis system with an open architecture that supports multiple metrology and process tool types for real-time process control

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Teron™ 640e

Reticle defect inspection product line with defect enhancement technology for high performance EUV and 193nm reticle quality control in mask shops

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LMS IPRO7

Reticle pattern registration metrology system with high accuracy on-device measurements for advanced reticle production and IC patterning

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