Patterning Simulation

Patterning Simulation

KLA’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.

PROLITH™

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PROLITH™

Real Virtual Patterning

The PROLITH™ lithography and patterning simulation solution uses innovative models to accurately simulate how designs will print on the wafer. PROLITH is used by IC, LED and MEMS manufacturers, scanner companies, track companies, mask manufacturers, material providers and research consortia to cost-effectively evaluate patterning technologies, including EUV lithography and multiple patterning techniques. As a critically important modeling tool for all patterning processes, PROLITH helps lithographers understand how pattern printing is affected by multiple lithography variables while significantly reducing the time required to identify workable solutions.

Users Only site Technical Support

Applications
Advanced patterning simulation, Wafer topography modeling
Related Products

PROLITH 2020a: Windows based, physical lithography simulator capable of deterministic and stochastic output. PROLITH 2020a provides rigorous handling of mask topography, wafer topography, photoresist modeling and SEM metrology for quantitatively accurate output.

PROLITH Enterprise 2020a: All the features of the core PROLITH 2020a, plus a scalable Linux engine suitable for large simulation jobs, e.g. stochastic simulation of “Black Swan” events in EUV lithography or tasks that require running thousands of mask clips. An optional enhanced dissolution model that accurately describes the behavior of NTD (Negative Tone Development) chemically amplified resists is available.

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