KLA will be attending the NCCAVS 40th Annual Equipment Exhibition. Please come and see us at our booth to discuss the advantages of our contact and optical profilers.

The NCCAVS Equipment Exhibition is an annual event that showcases products and services of companies supporting vacuum-related industries. Attracting approximately 100+ exhibitors and ~700 attendees, the NCCAVS Annual Equipment Exhibition is the largest sponsored by any AVS Chapter.

KLA's Dr. Xuemei Chen will present "Future Patterning Challenges: It's not 2D, it’s 3D."

LithoVision is the premier technical event that brings together industry experts with the objective of sharing a global view of future lithography trends, challenges and innovations with Nikon customers and industry partners.

KLA customers and KLA authors will present their latest advanced lithography process control work. Presentation topics and schedule are listed here.

SPIE Advanced Lithography brings together lithographers, layout designers, materials scientists, and metrology/process control engineers for panel discussions, seminars and networking events. It is the semiconductor industry's most important lithography exhibition of the year. With a full spectrum of lithography and patterning topics, industry experts share and learn about state-of-the-art lithographic tools, resists, metrology, materials, etch, design, process integration and novel new approaches.

KLA and our industry partners will present four nanomechanical testing papers at TMS 2019. In addition to exhibiting at booth 327, KLA will sponsor the Bladesmithing Competition and the Materials and Manufacturing Innovation Keynote Session, focusing on autonomous materials research.

TMS 2019 will connect minerals, metals and materials scientists and engineers who work in industry, academia and government positions around the world. The event will draw more than 4,000 scientists and engineers and will feature four full days of technical programming, more than 80 symposia, two poster sessions and networking opportunities.

KLA's Li Chen will present "Yield Challenges and Innovative Inspection and Metrology Solutions for Sub-10nm Manufacturing" in the Yield Challenges in Advanced Nodes session March 14.

EDTM is becoming a premier conference for the electron devices community, providing a forum to focus on research and development from leading universities and manufacturing companies worldwide on a broad range of device-related topics including materials, processes, devices, packaging, modeling, reliability, manufacturing and yield.