Candela 8720

Candela 8720

The Candela 8720 advanced integrated surface and photoluminescence (PL) defect inspection system captures a variety of mission-critical substrate and epitaxial defects. Implementation of automated wafer inspection with statistical process control (SPC) methodology significantly cuts yield loss due to epi defects, minimizes metal-organic chemical vapor deposition (MOCVD) reactor process excursions, and increases MOCVD reactor uptime.

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