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Patterning Simulation

Close up of a defect inspection wafer

Patterning Simulation

KLA-Tencor’s patterning simulation systems use advanced models to explore critical-feature designs, manufacturability and process-limited yield of proposed lithography and patterning technologies. Our patterning simulation software allows researchers to evaluate advanced patterning technologies, such as EUV lithography and multiple patterning techniques, without the time and expense of printing hundreds of test wafers using experimental materials and prototype process equipment.


PROLITH™

Example view of PROLITH™ simulation results

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PROLITH™

Real Virtual Patterning

The PROLITH™ X6 lithography and patterning simulation solution uses innovative models to accurately simulate how designs will print on the wafer. PROLITH X6 is used by IC, LED and MEMS manufacturers, scanner companies, track companies, mask manufacturers, material providers and research consortia to cost-effectively evaluate patterning technologies, including EUV lithography and multiple patterning techniques. As a critically important modeling tool for all patterning processes, PROLITH X6 helps lithographers understand how pattern printing is affected by multiple lithography variables while significantly reducing the time required to identify workable solutions.


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Applications

Advanced patterning simulation, Wafer topography modeling

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