Implant and Wet Wafer Processing Technology
Wafer Implant and Wet Wafer Processing Technology
Advanced technology nodes require more precise wafer-level process control during wafer implant processes, and plasma implanters are unable to control all plasma parameters, such as wafer temperature, which affect dose uniformity and profile. Current wafer implant methods such as temp dots are incapable of measuring the wafer level effects of plasma variations and are not representative of the spatial distribution of wafer temperature and plasma effects. SensorWafers provide a unique way to capture the effect of the wafer processing environment on production wafers and allow you to obtain accurate temperature profiles with full wafer spatial resolution monitoring.
For wet wafer processing, SensorWafers provide critical wet wafer processing temperature data for emerging technology nodes. As specifications for wet cleans become increasingly tighter, SensorWafer's wet wafer processing technology enable you to get the most out of your high temperature, multi-chemical media wafer processing systems.
Base Station 300/300Z
Deployed robotically from the SensArray Base Station using standard wafer handling equipment, the Integrated or Integral SensorWafer begins its survey of the production path. When the process is complete, the base station manages downloading and communication of wafer data. The 300mm base station is built into a front opening unified pod (FOUP) to protect and transport the Integrated or Integral SensorWafer throughout the most advanced, automated fabrication facilities, and enables use with a variety of load port variations.
The Base Station is the central operating hub for the Integrated or Integral SensorWafer allowing you to:
- Upload the thermal measurement survey requirements to the Integrated or Integral SensorWafer, including sensor selection and scan rate
- Download thermal survey data from the Integrated or Integral SensorWafer
- Recharge the batteries in less than ten minutes
- Transfer survey measurement data immediately to a computer through a USB link
i3 Integral for Implant
Advanced technology nodes require more precise wafer-level process control during implant processes. Plasma implanters are unable to control all plasma parameters, such as wafer temperature, which affect dose uniformity and profile. Current methods such as temp dots are incapable of measuring the wafer level effects of plasma variations and are not representative of the spatial distribution of wafer temperature and plasma effects. Integral SensorWafers for wafer implant provide a unique way to capture the effect of the wafer implant process environment on production wafers and this allows you to obtain accurate temperature profiles with full wafer spatial resolution monitoring.
SensorWafer characterization of the PLAD implant process reveals large thermal profile differences between two chambers running the same process.
Implant Process Monitoring
i3 Integral for Wet Applications
The i3 Integral SensorWafer is a thin (1.15mm), accurate (±0.5°C) instrumented wafer designed to provide critical wet wafer processing temperature data for emerging technology nodes. As specifications for wet cleans become increasingly tighter, the i3 Integral enables you to get the most out of your high temperature, multi-chemical media wafer processing systems.
Uses of the Integral SensorWafer include:
- Reducing tool start up and qualification time
- Ensuring temperature uniformity of chemicals at the wafer surface
- Validating etch rates based on good temperature data
- Process development troubleshooting
Use the i3 Integral SensorWafer to establish a baseline temperature on a golden tool and perform chamber matching verification.
Wet Application Process Monitoring
The core of our data collection and analysis system for plasma applications begins with PlasmaView. PlasmaView is the process viewing system that puts the user inside the process zone for detailed process analysis. The plasma analysis system uplinks its measurements from PlasmaTemp, PlasmaVolt and Plasma Etch Integral SensorWafers and displays the plasma data versus time and space (2D or 3D). Movie views provide a feel for the critical transient responses and are useful for fault investigation.
Etch processes are notoriously difficult to control. The sheer complexity of etch systems and the number of process variables makes plasma etch a proverbial fab ‘hot spot’. Our PlasmaControl Enhanced Analysis Engine provides a new level of process control that will help monitor and control day-to-day operations and chamber-to-chamber matching. PlasmaControl distills the complicated etch environment down to a few critical control metrics and compares these metrics to user specifications for control. The user sees a ‘Go’ or ‘No-Go’ for each run with the ability to view trends, detect and investigate excursions and compare chambers. PlasmaControl is a key component in the PlasmaSuite plasma data collection and analysis solution set for etch applications.
PlasmaRx plasma data collection and analysis system gets inside the black box of plasma processes to help engineers identify the most likely cause of chamber problems. Despite advances in production techniques, process and equipment engineers still rely on their experience and trial and error methods to diagnose the chamber issues – a timely, costly and often frustrating experience. With PlasmaRx plasma data collection and analysis system, engineers can utilize their PlasmaTemp SensorWafers to effectively diagnose the root cause of the digression within minutes, all without opening the chamber or the need for other offline metrology. PlasmaRx, a key component of the PlasmaSuite plasma collection and data analysis system, gets you back in control quickly.
|At-a-glance screen displays reduce time needed to digest complex etch processes, providing quick Pass/Fail info.|