SPIE Photomask + Extreme Ultraviolet Lithography 2019

KLA is again a sponsor for SPIE Photomask + Extreme Ultraviolet Lithography 2019.

SPIE Photomask + Extreme Ultraviolet Lithography is the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Event Dates Sunday September 15 to
Thursday September 19, 2019
Location Monterey Conference Center and Monterey Marriott, Monterey, California


KLA is once again a sponsor of SEMICON Taiwan.

KLA’s DongChul Hong will present "Statistical process control of wafer temperature uniformity in etch process tools in a new approach" (IC Forum) and Edwin Chew will discuss "Front End Yield Management with Laser Based Inspection" (Power Electronics Forum).

SEMICON Taiwan is the premier event in Taiwan for microelectronics manufacturing. Connect with the companies, people, products and information shaping the future of design and manufacturing for semiconductors, nanoelectronics, MEMS, photovoltaics and related advanced electronics.

Event Dates Wednesday September 18 to
Friday September 20, 2019
Location Taipei Nangang Exhibition Center (TaipeiEx), Taipei, Taiwan

Composites and Advanced Materials Expo (CAMX)

We look forward to welcoming you to our booth at CAMX. Come and meet our experts and find a solution to meet your needs.

CAMX has established itself as North America’s event that connects and advances the world’s composites and advanced materials communities – the go-to marketplace for products, solutions, networking and advanced industry thinking.

Event Dates Monday September 23 to
Thursday September 26, 2019
Location Anaheim Convention Center, Anaheim, CA

International Conference on Silicon Carbide and Related Materials (ICSCRM)

KLA is thrilled to be returning to The International Conference on Silicon Carbide and Related Materials (ICSCRM). Please visit our booth and speak with our experts regarding the benefits and features of our compound semiconductor process control systems.

ICSCRM is the premier forum for technical discussion in all areas of silicon carbide (SiC) and other wide bandgap (WBG) semiconductors.

Event Dates Sunday September 29 to
Friday October 4, 2019
Location Kyoto International Conference Center, Kyoto, Japan

Webinar: Dynamic Nanoindentation

Dynamic nanoindentation involves superimposing a small oscillation on the semi-static force and measuring the resulting oscillation of the indenter. From the amplitude quotient and phase shift, one derives contact stiffness and damping. This additional dynamic information affords several advantages over basic nanoindentation, the most common of which is the ability to measure hardness and elastic modulus as a continuous function of surface penetration.

Register here

The topics in this webinar are applicable to our nanoindenter products.

Event Dates Wednesday October 9, 2019
12:00 pm – 1:00 pm, Eastern Time

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