Advanced technology nodes require more precise wafer-level process control during wafer implant processes, and plasma implanters are unable to control all plasma parameters, such as wafer temperature, which affect dose uniformity and profile. Current wafer implant methods such as temp dots are incapable of measuring the wafer level effects of plasma variations and are not representative of the spatial distribution of wafer temperature and plasma effects. SensorWafers provide a unique way to capture the effect of the wafer processing environment on production wafers and allow you to obtain accurate temperature profiles with full wafer spatial resolution monitoring.

For wet wafer processing, SensorWafers provide critical wet wafer processing temperature data for emerging technology nodes. As specifications for wet cleans become increasingly tighter, SensorWafer's wet wafer processing technology enable you to get the most out of your high temperature, multi-chemical media wafer processing systems.