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Automated optical overlay metrology

Product Description

The Archer 200 optical overlay control system meets the stringent performance and cost-of-ownership (CoO) requirements for the most advanced design rules, including 32nm and double-patterning lithography. With major improvements to its core optical design, plus the addition of optional scatterometry measurement technology (SCOL) this extendible system satisfies the tightest production overlay budgets, yet is designed to keep pace with increasingly challenging lithography control needs. The Archer 200 optical overlay metrology system supports technologies that extend 193nm lithography, such as immersion and double-patterning techniques.

 

  • 20% tighter total measurement uncertainty (TMU) satisfies tighter overlay error budgets with improved precision
  • SCOL scatterometry option provides increased flexibility in meeting specific 32nm and beyond dimensional metrology requirements. The combination of optical imaging and SCOL is a unique low-risk configuration with excellent accuracy and matching to AIM targets.
  • 25% higher productivity over the previous-generation Archer system with 20% faster Move-Acquire-Measure (MAM) time, 30 to 50% improvement in tool matching and higher throughput.
  • Enhanced optical system passes more light, for faster measurement and higher throughput.
  • Uses the industry-standard AIM™ target, or even smaller µAIM™ targets that can be inserted into different locations within the chip itself.

Application

Lithography overlay

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Related Information

Archer 200 Product Overview