Process Control at the Source

Five new systems support patterning control for advanced IC manufacturing.

KLA’s advanced patterning control systems help IC manufacturers achieve the strict process tolerances required at the sub-7nm logic and leading-edge memory design nodes. Our five new systems are key components in a broad portfolio of metrology, inspection and analysis systems – built on an open architecture – that supports identification and control of patterning variations at the source.

ATL™

Scatterometry-based overlay metrology system with unique tunable laser technology for highly accurate and robust overlay error measurements in production

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SpectraFilm™ F1

Films metrology system with multiple optical technologies for high precision film thickness and bandgap measurements on advanced film stacks

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5D Analyzer™ X1

Advanced data analysis system with an open architecture that supports multiple metrology and process tool types for real-time process control

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Teron™ 640e

Reticle defect inspection product line with defect enhancement technology for high performance EUV and 193nm reticle quality control in mask shops

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LMS IPRO7

Reticle pattern registration metrology system with high accuracy on-device measurements for advanced reticle production and IC patterning

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