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Enabling real-time process control for leading edge patterning

Seamlessly integrated with a wide range of metrology systems, including overlay, reticle registration, wafer geometry, films, critical dimension, and device profile metrology systems, K-T Analyzer is part of KLA-Tencor’s comprehensive 5D patterning control solution. In particular, it analyzes data from the KLA-Tencor ArcherTM overlay, AlerisTM thin film, SpectraShapeTM optical critical dimension, WaferSightTM PWG patterned wafer geometry and LMS IPRO mask registration metrology systems, as well as scanner data, to enable a variety of offline and real-time use cases for advanced patterning control.

  • Advanced overlay analysis and modelling, process signature identification and baselining
  • Real-time overlay corrections, including HOC and OPO (on-product overlay) R2R corrections per exposure
  • Scanner Data Analysis, Scanner Alignment optimization and Scanner Fleet Management
  • Enhanced CDU analysis with focus/dose per exposure corrections
  • Enhanced CDU analysis with focus/dose per exposure corrections
  • Analysis and correlation of reticle data and wafer shape data to overlay
  • Widely adopted by leading IC manufacturers

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