Overlay Metrology Systems

Product Description


The ATL™ (Accurate Tunable Laser) is a high performance scatterometry-based overlay metrology system designed to meet the required accuracy and process robustness needs for overlay control at the 7nm node and beyond. Tunable laser technology with 1nm resolution paired with a real-time homing algorithm maintains overlay accuracy and process robustness for leading-edge development and high volume manufacturing. The ATL optical overlay metrology system supports a diverse range of scatterometry overlay measurement target designs, including in-die and small pitch, enabling accurate overlay error measurement for different process layers, device types, design nodes and patterning technologies.

  • Production-proven scatterometry-based system includes multiple innovations that support overlay measurement on advanced IC devices, including:
    • Tunable laser technology with 1nm resolution enables high accuracy overlay measurements for fast technology ramps and improved yield performance
    • High intensity light source enables narrow bandwidth required for maintaining robust and accurate overlay measurements when challenged with process variation
    • Homing™ automatically maintains both on product overlay and accuracy stability to produce process robust overlay measurements
    • On-the-fly pupil data provides indications of process variation during production runs and enables flags for real-time monitoring
    • Automatic recipe optimization (ARO) reduces recipe setup time to a minimum while efficiently evaluating and ranking recipe configurations for the best accuracy
  • Reduced MAM (Move-Acquire-Measurement) time significantly increases tool throughput and reduces system cost of ownership
  • Seamless integration with 5D Analyzer®, an advanced data analysis system, provides immediate feedback on the quality of the lithography process and real-time data for scanner corrections to improve CPk for HVM and enable fleet management for ARO and Homing
  • Connectivity with Recipe Database Manager (RDM), a centralized database of production-proven recipe components, improves fab productivity by reducing setup time and increasing the reliability of measurement recipes
  • Built on the combo ready and extendible CrossbowTM platform to provide future upgradability while protecting a fab’s capital investment


Multi-Patterning Technologies: The implementation of complex multi-patterning technologies reduces the tolerable overlay error to just a couple nanometers at the 7nm design nodes and beyond. The ATL’s overlay measurement capability provides the Total Measurement Uncertainty (TMU) and accuracy needed to assess overlay performance on multi-patterning layers while maintaining process robustness.

In-line Monitoring: For high volume manufacturing, the ATL’s fast measurement speed and tunable laser technology with Homing™ produce accurate and robust overlay measurements, enabling quick identification of wafers with overlay error. On-the-fly pupil data provides indications of process variation during production runs and enables flags for real-time monitoring on a wide range of device types and process layers associated with 7nm device integration schemes. The overlay error data collected during production is seamlessly integrated with the 5D Analyzer analysis system to help lithographers accurately disposition wafers, reduce unnecessary wafer rework, and minimize the cycle time required to address variations in lithography tool performance. Innovative quality flags identify process changes at run time and enable fast process monitoring and excursion prevention.

Scanner Qualification: The ATL scatterometry-based overlay metrology system provides the high performance overlay measurement capability required to qualify both 193i and EUV based scanners to improve patterning accuracy on advanced design node devices. With fast measurement speed and the use of small in-die targets, the ATL overlay metrology system can take more measurements across the wafer with higher accuracy, generating the data required to instruct the scanner to make complex, higher-order corrections. These higher-order corrections are required to manage the tighter overlay tolerances encountered at advanced design nodes.

Patterning Control: The ATL provides accurate and robust overlay measurements for advanced design nodes and is a key component in KLA-Tencor’s 5D Patterning Control Solution™ which allows fabs to characterize, optimize and monitor fab-wide patterning processes using high-performance metrology systems and advanced data analysis.

For information on the Archer Series of overlay metrology tools that support high performance optical overlay metrology, please see: Archer Series

For other overlay metrology systems, please see K-T Certified

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