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5D Patterning Control Solution™
Enabling real-time process control for leading edge patterning

Seamlessly integrated with a wide range of metrology systems, including overlay, reticle registration, wafer geometry, chamber temperature, films, critical dimension, and device profile metrology systems, 5D Analyzer® is part of KLA-Tencor’s comprehensive 5D Patterning Control Solution™. In particular, it analyzes data from the KLA-Tencor Archer™ overlay, Aleris™ and SpectraFilm™ thin film, SpectraShape™ optical critical dimension, SensArray® etch temperature, WaferSight™ PWG patterned wafer geometry and LMS IPRO mask registration metrology systems, as well as scanner data, to enable a variety of offline and real-time use cases for advanced patterning control.

 

  • Advanced overlay analysis and modelling, process signature identification and baselining
  • Real-time overlay corrections, including HOC (high order correction) and OPO (on-product overlay) corrections per exposure
  • Scanner Data Analysis, Scanner Alignment optimization and Scanner Fleet Management
  • Enhanced CDU analysis with focus/dose per exposure corrections
  • Analysis and correlation of reticle data and wafer shape data to overlay
  • Widely adopted by leading IC manufacturers

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