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Surface Defect Detection and Optical Surface Analysis

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Product Description

  • Offers <0.08 micron particle sensitivity on polished silicon wafer surface
  • Exceptional sensitivity to microscratches for automatic wafer surface inspection, surface defect detection and defect classification on 2" - 12" transparent and opaque wafers.
  • Dual-laser Optical X-Beam surface defect analyzer technology is well-suited for both laboratory and low volume production applications.

The Candela CS10 Optical Surface Analyzer offers a new approach to unpatterned wafer surface defect detection. By combining two laser paths and four independent wafer surface defect detection techniques, the CS10 Optical Surface Analyzer offers exceptional sensitivity to particles and scratches on optoelectronics and semiconductor wafers.

Using a fast spiral scan motion, the CS10 Optical Surface Analyzer simultaneously measures phase shift, scattered light, reflected light, and topography. The CS10 Optical Surface Analyzer  provides data that is represented as high resolution image maps to facilitate visual surface defect inspection, or automatically analyzed for the detection and classification of wafer surface defects.

The compact CS10 Optical Surface Analyzer platform is well-suited for both laboratory and low volume production applications. This optical surface defect analyzer is easy to learn and operate. This optical surface analyzer is the ideal wafer surface defect detection system for failure analysis and process development applications.

For more information on the CS10 Optical Surface Analyzer contact our authorized sales representatives in the United States, Asia or Europe. For inquiries, please contact our Sales, Service, or Applications teams.

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