KLA-Tencor 5D Patterning Control Solution: Optimal patterning through fab-wide process control


KLA-Tencor’s innovative 5D Patterning Control Solution™ drives optimal patterning through the characterization, optimization and monitoring of processes inside and outside the lithography module. By identifying fab-wide sources of pattern variation and implementing intelligent feedback and feed forward process control loops, this 5D Patterning Control Solution helps chipmakers obtain improved patterning using existing process equipment for faster, cost-effective yield ramps.

The 5D Patterning Control Solution includes the following process control solutions and systems:

Crossbow Series: wafer pattern overlay Archer Series: wafer pattern overlay
SpectraFilm: films thickness, refractive index, stress SpectraShape: critical dimension and feature shape
5D Analyzer: data analysis and patterning control WaferSight PWG: patterned wafer geometry
Teron 600 Series: reticle defect for mask shops Teron SL650 Series: reticle defect for IC fabs
LMS IPRO: reticle pattern registration RDC: reticle data analysis and management
SensArray: in-situ process monitor ProDATA: Process window analysis
PROLITH: virtual patterning

KLA-Tencor Introduces Five Patterning Control Systems for Sub-7nm IC Manufacturing

KLA-Tencor Introduces New Metrology Systems for Leading-Edge Integrated Circuit Device Technologies

KLA-Tencor Introduces Key Systems for 5D™ Patterning Control Solution

KLA-Tencor Extends its 5D™ Patterning Control Solution with New Metrology Systems


5D Patterning Control Solution Video Overlay and Film Metrology Systems for 5D Patterning Control Solution
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