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altProduct Description

The SpectraCD-XTR optical CD/profile metrology system delivers improved precision accuracy, and tool-to-tool matching at the highest throughput and lowest cost-of-ownership (CoO) available. Evolved from the industry-leading, fourth-generation SpectraCD-XT system, the SpectraCD-XTR optical CD and profile metrology system uses patented spectroscopic ellipsometry (SE) technology to give chipmakers the ability to reliably predict performance and yield of complex devices in production and to identify potential yield and performance issues for next-generation products in development.

  • Industry-leading throughput is twice that of traditional CD-SEMs and significantly higher than that of other optical CD systems
  • Improved precision and accuracy over the SpectraCD-XT optical CD system and full profile metrology capability enable next-generation IC product development
  • Highest throughput and best tool-to-tool matching are designed to meet the production needs of high-volume logic, memory, and foundry fabs
  • SpectraCD-XT optical CD and profile metrology tools can be upgraded in the field to XTR capability, as a means of protecting and extending a fab’s capital investment

Application

Production CD line monitoring: Measures production wafers (post-lithography and -etch) to enable accurate CD control. The SpectraCD-XTR optical CD and profile metrology system provides much lower CoO than that of traditional CD-SEM metrology while giving information about profile shape that CD-SEM cannot.

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