| Candela 8620 |
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Enables Improved Substrate and MOCVD Process Control Yield
Product Description The Candela® 8620 substrate and epitaxy (epi) wafer inspection system is designed for LED device manufacturers to provide automated defect inspection for LED materials such as gallium nitride, sapphire, and silicon carbide—enabling enhanced quality control of both opaque and transparent substrates, faster time-to-root cause, and improved Metal Organic Chemical Vapor Deposition (MOCVD) reactor uptime and yield.
With its proprietary optical design and detection technology, the Candela 8620 LED substrate and epi wafer inspection system detects and classifies sub-micron defects that are not consistently identified by current inspection methods—thereby enabling for the first time a production line monitor for these yield-limiting defects. As LED manufacturers transition production to larger wafer sizes and introduce new patterned sapphire substrate (PSS) processes, there is significant economic impact of resulting process-induced defects. Defects from substrate and epi processes impact device performance, yield and field reliability. The Candela 8620 LED substrate and epi wafer inspection system can detect:
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