Defect Inspection

Substrate

Candela CS10
Optical X-BeamTM Surface Analyzer

Product Description

  • Offers <0.08 micron particle sensitivity on polished silicon wafers
  • Exceptional sensitivity to microscratches for automatic wafer inspection, defect detection and classification on 2" - 12" transparent and opaque wafers.
  • Dual-laser X-Beam technology is well-suited for both laboratory and low volume production applications.

The Candela CS10 Optical Surface Analyzer offers a new approach to unpatterned wafer inspection. By combining two laser paths and four independent detection techniques, the CS10 offers exceptional sensitivity to particles and scratches on optoelectronics and semiconductor wafers.

Using a fast spiral scan motion, the CS10 simultaneously measures phase shift, scattered light, reflected light, and topography. The data is represented as high resolution image maps to facilitate visual inspection, or automatically analyzed to detect and classify defects.

The compact CS10 platform is well-suited for both laboratory and low volume production applications. Easy to learn and operate, it's the ideal wafer inspection system for failure analysis and process development applications.

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