| Process Solutions |
SensArray products are customized to fit the needs of nearly all semiconductor processes. Each combination requires a very specific Process Probe wafer due to the varying temperatures, chemistries, and build of the chamber. By selecting the process area that you work in, you'll be able to find the SensArray solution that is right for you!
Atmospheric & Belt CVDAt SensArray, we pride ourselves on matching the right product with any system. SensArray’s Process Probe 1630 instrumented wafers enable precise in-situ characterization of wafer temperature profiles for atmospheric and belt CVD systems. With the Process Probe 1630, you can monitor and optimize film characteristics in Watkins Johnson deposition systems, and other types of CVD equipment that require rugged test wafers. By utilizing the patented ThermaBond technique, the thermocouple bond to the silicon substrate increases the heat transfer allowing for tighter tracking and high accuracy, especially when measuring gas injector temperatures. Determine edge to center temperature to adjust heater zone set points. Measure drift in deposition temperature to adjust for heat transfer changes from oxide build-up on the heaters and belt.
Downstream Plasma Etch/StripAt SensArray, we pride ourselves on matching the right product with any system. With the Process Probe 1530, you get an ideal solution for characterizing and fine-tuning your process conditions to improve equipment performance, wafer quality, and yield. The Process Probe 1530 is designed for use in temperatures ranging from 0°C to 1100°C, and for a wide range of applications including cold wall, RTP, sputtering, CVD, plasma strippers, and Epitaxial reactors. Our specially patented ThermaBond technique is utilized to ceramically bond the deeply immersed thermocouple into a re-entrant cavity in the silicon to improve heat transfer and bond strength. Measure wafer temperatures directly, in real time, during each critical step of your process cycle. Optimize temperature controller parameters, improve uniformity in multi-zone heaters, and determine wafer temperature stabilization times.
EPI ProcessingWith the Process Probe 1530, you get an ideal solution for characterizing and fine-tuning your process conditions to improve equipment performance, wafer quality, and yield. The Process Probe 1530 is designed for use in temperatures ranging from 0°C to 1100°C, and for a wide range of applications including cold wall, RTP, sputtering, CVD, plasma strippers, and Epitaxial reactors. Our specially patented ThermaBond technique is utilized to ceramically bond the deeply immersed thermocouple into a re-entrant cavity in the silicon to improve heat transfer and bond strength. Measure wafer temperatures directly, in real time, during each critical step of your process cycle. Optimize temperature controller parameters, improve uniformity in multi-zone heaters, and determine wafer temperature stabilization times.
Flat Panel SubstratesSensArray offers a complete set of flexible tools for measuring and analyzing FPD thermal processes. Our solutions can be used by tool manufacturers during R&D to perform quality control checks, helping to shorten development cycles. They can also be used for troubleshooting in the field, as well as for maintenance routines performed by the tool manufacturers or by the FPD manufacturers themselves.
Hot WallAt SensArray, we pride ourselves on matching the right product with any system. The Process Probe 1535-instrumented wafer is ideal for process temperature monitoring of hot wall systems, and oxidizing cold wall environments. Use the Process Probe 1535 in a variety of equipment, over a wide range of temperatures from 0°C to 1100°C. With exceptional measurement accuracy, you can tighten control parameters, reduce equipment qualification time, calibrate temperature setpoints, and optimize edge to center temperature differentials to minimize wafer stress. The ThermaBond technique, which embeds the thermocouple sensors into the silicon, delivers unprecedented measurement accuracy and optimum reliability. Durable, easy to use, and versatile, the Process Probe 1535 wafer ensures an excellent return on your investment in quality improvement.
Ion Implantation Systems
LPCVD Hot WallThe Process Probe 1535-instrumented wafer is ideal for process temperature monitoring of hot wall systems, and oxidizing cold wall environments. Use the Process Probe 1535 in a variety of equipment, over a wide range of temperatures from 0°C to 1100°C. With exceptional measurement accuracy, you can tighten control parameters, reduce equipment qualification time, calibrate temperature setpoints, and optimize edge to center temperature differentials to minimize wafer stress. The ThermaBond technique, which embeds the thermocouple sensors into the silicon, delivers unprecedented measurement accuracy and optimum reliability. Durable, easy to use, and versatile, the Process Probe 1535 wafer ensures an excellent return on your investment in quality improvement.
LPCVD/SACVD Cold Wall
MCVD/MOCVDWith the Process Probe 1530, you get an ideal solution for characterizing and fine-tuning your process conditions to improve equipment performance, wafer quality, and yield. The Process Probe 1530 is designed for use in temperatures ranging from 0°C to 1100°C, and for a wide range of applications including cold wall, RTP, sputtering, CVD, plasma strippers, and Epitaxial reactors. Our specially patented ThermaBond technique is utilized to ceramically bond the deeply immersed thermocouple into a re-entrant cavity in the silicon to improve heat transfer and bond strength. Measure wafer temperatures directly, in real time, during each critical step of your process cycle. Optimize temperature controller parameters, improve uniformity in multi-zone heaters, and determine wafer temperature stabilization times.
OvensOven settings can be delicate, and if they fall outside of the process window, valuable product can be lost. Knowing if your oven settings are accurate and maintaining repeatability of optimum settings is vital to the successful outcome of the process. SensArray offers several tools for profiling oven temperature.
PECVD
Photoresist Track Systems
Plasma Etch
Plasma Strip with Bias Potential
Prober Hot Plates & Chillers
PVD
Rapid Thermal Processing
Spin-on Dielectric
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