Metrology

Reticle

LWM9045
Advanced Mask CD Metrology

Product Description

The LWM9045 is a SEM-based Critical Dimension (CD) measurement system for photomasks. This system was designed specifically to address the needs of 45nm technology node photomask production and 32nm process development. Its proprietary technology controls the charging effect, improves the column and scanning system with the new electron detector system, and provides stable imaging conditions to avoid image drift. This leads to highly repeatable critical dimension measurements on all types of photomasks including Extreme Ulta-Violet (EUV) masks and Nanoimprint lithography (NIL) templates.

 

  • Sub 1nm long-term measurement repeatability ensures accuracy in product qualification
  • Accurate laser stage combined with sophisticated positioning software prevents time consuming pattern recognition or missed measurements. This leads to greater throughput and system productivity.
  • Using an Ozonizer ensures that the SEM chamber is clean to prevent photomask contamination and maintain accurate measurement repeatability and minimal contamination-induced slope effect
  • Ease-of-use with offline job set-up and data evaluation from an office PC increases the effective utilization of the measurement tool, increasing throughput

Applications
Mask CD measurement

Contact Me >

Related Information