|Teron 600 Series|
Reticle Defect Inspection Systems
Teron 630 Teron 610 TeraScan 500XR
The Teron 630 Series is the latest in the Teron 600 Series of 193nm-wavelength reticle inspection systems. Designed for defect inspection of optical and EUV reticles during both photomask development and production, the Teron 630 targets the 1Xnm logic and 2Xnm half-pitch memory nodes. This defect inspection system for photomask production also provides full capability for older generation reticles.
The Teron 630 photomask defect inspection system relies on advanced imaging modes, low-noise operation, third-generation database modeling and sophisticated defect detectors to enable high defect sensitivity on the most challenging reticle types, including quartz etch. To support EUV production, the system is ultra-clean with EUV-compatible reticle handling and EUV dual-pod support. The Teron 630 photomask defect inspection system also has special inspection modes available to detect particles on blanks and surface phase defects on EUV blanks.
The Teron 630 photomask defect inspection system supports a mix-and-match strategy with other KLA-Tencor systems for cost-effective reticle manufacturing of critical and non-critical layers within a reticle set. The Teron 630 Series is offered in several models and configurations to meet the varied needs of reticle manufacturers.
The Teron 630 Series also includes: