|Teron 600 Series|
Reticle Defect Inspection Systems
Teron 630 Teron 610 TeraScan 500XR
The Teron 630 Series is the latest in the Teron 600 Series of 193nm-wavelength reticle inspection systems. Designed for defect inspection of optical and EUV reticles during both development and production, the Teron 630 targets the 1Xnm logic and 2Xnm half-pitch memory nodes. This reticle defect inspection system also provides full capability for older generation reticles.
The Teron 630 reticle defect inspection system relies on advanced imaging modes, low-noise operation, third-generation database modeling and sophisticated defect detectors to enable high defect sensitivity on the most challenging reticle types, including quartz etch. To support EUV production, the system is ultra-clean with EUV-compatible reticle handling and EUV dual-pod support. The Teron 630 also has special inspection modes available to detect particles on blanks and surface phase defects on EUV blanks.
The Teron 630 series supports a mix-and-match strategy with other KLA-Tencor systems for cost-effective reticle manufacturing of critical and non-critical layers within a reticle set. The Teron 630 Series is offered in several models and configurations to meet the varied needs of reticle manufacturers.
The Teron 630 Series also includes: