Error-free reticles, or masks, are the first step in achieving high semiconductor device yields, since reticle defects can be replicated on production wafers. KLA-Tencor offers high sensitivity reticle inspection and metrology systems for mask shops, helping ensure that reticles are defect-free and meet mask metrology requirements. The reticle inspection systems use optical imaging and multiple inspection modes to find all types of reticle defects prior to printing on the wafer. The metrology systems ensure quality reticle manufacturing by providing the best precision for reticle pattern placement and accurate measurement of reticles’ critical dimensions.
- Teron 600 Series: Photomask inspection systems designed to enable development and production of advanced optical and EUV reticles
CD and Overlay Metrology
- IPRO Series: Reticle pattern placement metrology system
Data Management and Analysis
- Reticle Decision Center: RDC – reticle data analysis and management
- Klarity Defect: A reticle defect data management and analysis module is available as an option of Klarity Defect