SAN JOSE, Calif., July 5, 2000-KLA-Tencor Corp. (Nasdaq: KLAC) today introduced IMPACT SEM XP™, the latest addition to its IMPACT XP suite of automatic defect classification (ADC) software solutions. With IMPACT SEM XP, KLA-Tencor brings to its eV300 SEM review tool the same production-proven ADC capabilities already implemented on its high-resolution optical wafer inspection platforms-enabling intelligent defect sampling and classification, and more rapid, consistent and accurate sourcing of yield-limiting defects that affect device performance and reliability. With these new capabilities, customers can optimize the eV300 for use in classifying and reviewing the extremely small defects associated with advanced semiconductor manufacturing processes including 0.13-micron and smaller design rules, thus dramatically reducing the cost of ownership (CoO) of SEM review.

"At the 0.13-micron node, new processes such as dual damascene and new materials such as copper and low-k dielectrics pose unprecedented manufacturing and yield management challenges for chipmakers," stated Dave Bakker, general manager of KLA-Tencor's Defect Review and Classification Division. "Failure to successfully implement these new technologies and materials will leave chipmakers behind in the technology race. To meet these challenges, tighten their manufacturing processes and accelerate their yield-learning curve, they need easy-to-use ADC-based inspection systems that are tunable to the specific new defect types associated with these technology transitions."

"IMPACT SEM XP delivers a unique sampling capability that enables fabs to accurately analyze and classify these new defects," added Bakker. "Leveraging our proven High-Resolution Defect Classification (HRDC™) technology frees IMPACT SEM XP to focus only on those defects that require SEM review. For the customer, this translates to faster time to results, reduced CoO and improved device performance."

IMPACT SEM XP is one component of a closely integrated suite of in-line products that together optimize sampling and leverage the SEM tool to its highest potential. Two key elements of this suite are RTCÃ? for real-time classification of defects as the wafer is being inspected, and HRDC for high-resolution defect classification while the wafer resides on the inspector. RTC can be used to coarsely classify defects and determine a more focused sample of defects for further review. These sampled defects can then be further classified using HRDC and SEM ADC, thereby making the overall defect classification process more efficient and cost effective.

Another key feature of IMPACT SEM XP is SmartGalleryÃ?, an easy-to-use interface common to both optical and e-beam platforms. With SmartGallery, fab engineers can leverage training and experience obtained from an optical ADC inspection tool to the SEM ADC tool-minimizing the time and expertise required to set up a SEM ADC system. Foundries and ASIC manufacturers will especially benefit from faster SEM ADC setup time since, for them, product life spans are short and time-to-yield is critical.

IMPACT SEM XP also enables the creation of customer-configurable defect classes based on any given process layer. This flexibility provides better classification results across all layers, and gives customers the ability to implement an ADC strategy that best fits their production requirements. It also allows fabs to use existing classification schemes, thus minimizing the impact of implementing ADC on personnel training other existing fab procedures. Other ADC solutions currently on the market classify defects based on pre-set classes, or fixed classification bins, that are common for all layers. As a result, they have difficulty providing information that correlates to layer-specific yield-limiting defects.

"KLA-Tencor's proven IMPACT XP solution has more than 300 implementations in over 80 fabs worldwide with a 90 percent market share," noted Bakker. "With the experience gained by providing customers with this advanced ADC solution for in-line optical monitoring, we developed IMPACT SEM XP-bringing the benefits of in-line ADC to SEM review. As a result, we now have a complete ADC solution that enables our customers to implement a fab-wide yield management strategy that is flexible, easy to implement and provides the lowest CoO."

About KLA-Tencor: KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. Headquartered in San Jose, Calif., the company has sales and service offices around the world. An S&P 500 company, KLA-Tencor is traded on the Nasdaq National Market under the symbol KLAC.

Contact:
Meggan Powers
Director Corporate Communications