PRODUCTS

Certified Used Equipment

KLA-Tencor Introduces Reticle Inspection Tool For Comprehensive Quality Assurance Of Pelliclized Reticles At The 0.10-Micron Node
Share
TeraStar™ combines 3X increase in throughput and 100-nm defect capture to address stringent requirements for advanced reticles used in high-volume integrated circuit production

SAN JOSE, Calif., Sept. 12, 2000-KLA-Tencor Corp. (Nasdaq: KLAC) today introduced TeraStar™, the company's new reticle inspection tool, which has the high sensitivity needed to deliver comprehensive detection of all types of particle, contamination and pattern defects on multi-die pelliclized reticles. A member of KLA-Tencor's new Tera™ family of reticle inspection tools, TeraStar is the newest evolution of the company's widely adopted STARlight™ technology. Developed in cooperation with International SEMATECH, TeraStar provides a three-fold increase in throughput compared to previous inspection platforms and can detect defects as small as 100 nm. Its high throughput and sensitivity make it an ideal tool for pre- and post-pelliclization inspection in photomask manufacturing operations, as well as for incoming quality control (IQC) and re-qualification in wafer fabs.

Chipmakers are increasingly implementing sub-wavelength lithography strategies to extend the life of existing lithography tools, while continuing to aggressively shrink device geometries. Sub-wavelength lithography, however, introduces new complex patterns resulting from reticle enhancement techniques, such as optical proximity correction (OPC) and phase shift mask (PSM) technologies, which are extremely difficult and time-consuming to accurately inspect. TeraStar is a high-throughput tool designed to inspect the multi-die pelliclized reticles used for manufacturing application specific integrated circuits (ASICs) and high-volume integrated circuits (ICs). It has the sensitivity needed to deliver the most comprehensive and lowest cost-of-ownership solution currently available on the market for inspecting all pelliclized reticles, including those incorporating advanced OPC and PSM features.

"As the world's largest volume-user of reticles, having defect-free reticles is a necessity to ensuring minimal yield loss during semiconductor production," noted Jia-Jing Wang, senior director of E-Beam Operations at TSMC. "We went to KLA-Tencor, a leader in reticle inspection, and outlined our need for a tool with the speed and sensitivity to deliver advanced reticle inspection capabilities required to produce our high-volume, leading-edge ICs. We are pleased that KLA-Tencor provided us with the opportunity to participate in this joint development partnership. KLA-Tencor's new TeraStar tool addresses our specific needs, and we expect it will provide us with a first line of defense against defects that might otherwise be missed by other inspection techniques and subsequently printed onto wafers during manufacturing. We are eager to install TeraStar in our mask manufacturing as soon as it is available."

TeraStar uses a unique beam-splitting technology to provide multi-beam UV reticle inspection capabilities, and incorporates a superior image computer that enables the use of KLA-Tencor's proprietary Tera algorithms to provide high-sensitivity, die-to-die pattern inspection. It can conduct simultaneously transmitted and reflected (STAR) light inspection for contamination with concurrent die-to-die pattern inspection for detection of pattern defects on the chrome surface of reticles, thereby improving the throughput of the tool by three- to six-fold compared to previous generation STARlight 300-Series tools. In addition, TeraStar detects defects on both the pellicle surface and backside of reticles in a single operation.

At maximum sensitivity, TeraStar can inspect a standard 6-inch reticle in less than one hour. For less critical layers on the reticle, TeraStar can provide inspection at better than 20 minutes per reticle. TeraStar also supports existing defect data communication links to installed defect repair and defect review systems.

"TeraStar is an evolution of our widely accepted STARlight tool, which has seen nearly 100 percent adoption with chipmakers and mask manufacturers alike," stated Lance Glasser, general manager of KLA-Tencor's Reticle and Photomask Inspection Division. "By combining our industry-leading STARlight technology with our new, powerful Tera algorithms and computing platform, we've provided our customers with a combination of speed, sensitivity and low cost of ownership that makes it both effective and affordable to ensure the quality of advanced pelliclized reticles.

Production shipments of the TeraStar system will begin early next year.

About KLA-Tencor: KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. Headquartered in San Jose, Calif., the company has sales and service offices around the world. An S&P 500 company, KLA-Tencor is traded on the Nasdaq National Market under the symbol KLAC.

Contact:
Meggan Powers
Director Corporate Communications

 

 

Related Products