KLA-Tencor And DuPont Photomasks Announce Successful Beta Test Of TeraStar Tool for Sub-Wavelength Reticle Inspection
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Successful test on reticles developed for 130 nm and smaller design rule applications results in purchase of two additional TeraStar systems

SAN JOSE, Calif. and ROUND ROCK, Texas, Oct. 24, 2001 -- KLA-Tencor Corp. (NASDAQ: KLAC) and DuPont Photomasks, Inc. (NASDAQ: DPMI) today announced that having completed beta testing of KLA-Tencor's TeraStar™ SLF27 reticle inspection tool at DuPont Photomasks' Round Rock facility, two additional TeraStar tools have been ordered. In addition to the system in Round Rock, new tools are being installed at DuPont Photomasks Taiwan and the DPI Reticle Technology Center, a world leading photomask research and development facility.

The high-throughput, high-sensitivity TeraStar system is designed to inspect sub-wavelength photomasks incorporating optical proximity correction (OPC) and phase shifting (PSM) features. DuPont Photomasks intends to use the TeraStar tools to inspect advanced photomasks manufactured for 130 nm integrated circuit (IC) production and 100 nm IC development applications in support of its customers around the world.

"Our customers are continuing to drive toward 130 nm and below design rules to improve chip performance and reduce cost. As a technology leader, DuPont Photomasks is committed to developing advanced process technology and outfitting our facilities with advanced equipment in order to support the expected increase in demand for photomasks supporting 130 nm design rules," said Preston Adcox, president and chief operating officer of DuPont Photomasks. "When used in conjunction with the multiple 130 nm production lines we have installed worldwide, we expect KLA-Tencor's TeraStar system will play a critical role in providing our customers with the high-quality sub-wavelength photomasks they will require to meet their advanced production and research and development needs."

"Our role as a partner in the development of the TeraStar tool highlights our practice of partnering with our strategic suppliers to ensure their new tools provide the capabilities needed to help us deliver the most advanced mask technology to our customers, ahead of our competition," continued Adcox. "We expect to use TeraStar--the most advanced reticle inspection tool available--along with our other installed base of tools to deliver advanced photomasks with the lowest cost of ownership (CoO) for all technology nodes."

The TeraStar SLF27 was developed in cooperation with International SEMATECH to meet the growing industry need for a tool with high productivity and high sensitivity to inspect sub-wavelength photomasks incorporating hard-to-inspect PSM and OPC features.

"As the industry strives to accelerate the pace of Moore's Law using sub-wavelength lithography, the ability to inspect complex photomasks is crucial," said Kurt Kimmel, mask program manager at International SEMATECH. "The development of the TeraStar product is the result of a longstanding cooperation between International SEMATECH and KLA-Tencor and is an important component of our objective to address the critical semiconductor industry issue of mask supply."

With throughput up to three times that of previous generation tools, TeraStar has the sensitivity to detect all types of particle, contamination and pattern defects on multi-die pelliclized reticles. According to DuPont Photomasks, the tool's extremely high throughput significantly reduces mask-manufacturing cycle times, enabling it to more quickly meet customer needs. In addition, proprietary Tera-- algorithms and an image computer enable the system to inspect up to one million by one million pixels per reticle--providing TeraStar with the sensitivity needed to capture defects as small as 100 nm. The system is based on KLA-Tencor's proven Starlight technology, which has been adopted for reticle inspection by nearly all global IC and mask manufacturers.

"We worked closely with DuPont Photomasks, a valued technology partner, in developing our TeraStar tool, which has proven to be a key enabler in the delivery of high-quality, complex OPC and PSM reticles for sub-wavelength lithography applications," stated Lance Glasser, vice president and general manager of KLA-Tencor's Reticle and Photomask Inspection Division. "With its high productivity and unparalleled sensitivity, this system has the versatility to make it ideal either for leading-edge reticle development where sensitivity is key, or for high-volume production where high throughput and productivity are required. In either case, the TeraStar system delivers the lowest CoO in the industry for advanced photomask inspection."

Note: Certain statements by DuPont Photomasks, Inc. contained in this document that are not historical facts are "forward-looking statements," as that term is defined in Section 27A of the Securities Act of 1933 and Section 21E of the Securities Exchange Act of 1934, that involve a number of risks and uncertainties. Such statements involve risks and uncertainties which may cause future activities and results of operations to differ from those suggested, including risks associated with management change, research and development programs, technology challenges in the manufacture of advanced photomasks, fluctuations in demand, and the installation and start-up of new equipment. For additional information, please refer to DuPont Photomasks' filings with the Securities and Exchange Commission, specifically the company's most recent Forms 10-K dated September 14, 2001, which identify important risk factors that could cause actual results to differ from those contained in the forward-looking statements. Results for interim periods are not necessarily indicative of results for the year. The forward-looking statements are made as of the release date hereof and the company disclaims any intention or obligation to update or revise any forward-looking statement or to update the reasons why the actual results could differ materially from those projected in the forward-looking statements, whether as a result of new information, future events or otherwise.

About DuPont Photomasks: DuPont Photomasks is a leading global provider of microimaging solutions including advanced photomasks, a key enabling technology used in the manufacture of semiconductor and other microelectronic devices. Headquartered in Round Rock, Texas, DuPont Photomasks operates a global network of manufacturing facilities serving semiconductor makers and other electronics producers around the world. The company also develops and produces the critical materials required for photomask-making, photoblanks (photomask substrates) and pellicles (protective covers for photomasks). DuPont Photomasks posted worldwide sales of approximately $408 million in fiscal 2001. Information about DuPont Photomasks can be found at http://www.photomask.com


About KLA-Tencor: KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. Headquartered in San Jose, Calif., the company has sales and service offices around the world. An S&P 500 company, KLA-Tencor is traded on the Nasdaq National Market under the symbol KLAC.

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