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Viper 2435
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Automated Wafer and Tool Dispositioning
viper2435
 

 

The Viper 2435 enables rapid, accurate, and cost-effective wafer and tool dispositioning at the litho, CMP, etch, and films modules. Designed to capture the broadest range of macro defect types at high sampling rates, the Viper 2435 helps engineers take corrective action early – preventing downstream production issues and yield loss.

  • A maximum throughput of 100 wafers per hour and high capture of defects of interest result in a 67% lower cost of ownership than manual inspection
  • Simultaneous brightfield and darkfield inspection channels, advanced algorithms, and full wafer inspection coverage enable accurate defect detection
  • Simultaneous inspection modes in a single pass, along with a Triple Load Port option, deliver high production throughputs
  • Enhanced signal-to-noise and adaptive thresholding techniques strengthen the tool’s nuisance suppression capabilities, reducing the need for review and delivering fewer false alarms
  • Full 300mm factory automation compatibility and easy recipe creation facilitate rapid and seamless production integration
  • Integrated data review tools deliver faster root-cause analysis

Applications

  • Wafer and Tool Dispositioning: Advanced algorithms and simultaneous brightfield and darkfield inspection channels enable the capture of the broadest range of defect types, delivering quick go/no-go indicators of wafer or process tool excursions.
  • Lithography: The Viper 2435 detects random lithography defects such as hotspots, scanner slit defocus, and localized coating striations, as well as whole-wafer defects such as no-coat, no-develop, and tilted reticles.
  • CMP: The detection of yield-limiting CMP defects such as residue, CMP pad damage, and scratches allows for CMP process re-work, resulting in fewer scrapped wafers.
  • Etch: Accurate wafer and tool dispositioning in the etch module depends upon the capture of etch defects such as corrosion, incomplete etch, over-etch, and no-etch.
  • Films: By detecting peeling, fall-on from chamber walls, oxide flaking, variation in film thickness, pin holes, and localized corrosion at high production throughputs, the Viper 2435 enables cost-effective films monitoring.

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