Product Description

The eDR-5200 is a new generation wafer defect review and classification system that enables engineers to rapidly identify and resolve yield issues on advanced devices. With innovative imaging technology and unique inspector connectivity, the eDR-5200 SEM review tool offers better review performance, faster yield learning and higher tool productivity.

• Higher stage accuracy and image resolution allow re-detection, imaging and classification of defects down to 30nm
• Proprietary connectivity to KLA-Tencor inspectors enables faster, more accurate inspector recipe setup on the SEM, and increased inspection capacity
• Power assisted classification (ePAC^TM) and fully automated defect classification (eADC^TM) produce the defect information required to make rapid, accurate yield decisions
• Innovative solutions achieve the fastest time to the highest quality defect Pareto:
  • High resolution imaging for accurate classification of subtle defects
  • High precision stage positioning and advanced re-detection algorithms for capture of low contrast or tiny defects
  • Proprietary optical information from KLA-Tencor inspectors for accurate separation of previous-layer defects from other SEM non-visuals

Applications

Defect Imaging: With an electromagnetic immersion column design and a broad range of beam operating conditions, the eDR-5200 delivers the resolution and flexibility required to image defects down to 30nm on a wide variety of processing materials.

Defect Re-detection: The eDR-5200 uses high stage accuracy, innovative de-skewing algorithms, and advanced re-detection methods to find even low contrast or tiny defects within a field of view down to 0.5µm.

Defect Classification: Easy-to-use, production-worthy techniques (eADC and ePAC) provide accurate classification of defects while an innovative, no-tilt EDX design allows for fast compositional analysis of defects.

Inspector Recipe Optimization: Seamless connectivity between the eDR-5200 and KLA-Tencor optical inspectors reduces recipe setup time by approximately 50%; produces higher quality inspection recipes and results; and enables improved equipment efficiency.

SEM Non-Visual Reduction: With unique imaging, classification and connectivity technologies, the eDR-5200 produces a Pareto with more defects of interest and fewer SEM Non-Visuals, providing engineers with the data required to make critical yield decisions.

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• eDR-5200 Product Overview

• Faster, Better Inspector Recipes
• SEM Non-Visual Defect Reduction

• Advances in SEM Review for Efficient Generation of Meaningful Paretos