| 281x Series |
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Brightfield Patterned Wafer Inspection Systems
Product Description The 2810 and 2815 are the industry's first memory- and logic-specific full-spectrum DUV/UV/visible brightfield patterned wafer defect inspection tools, detecting a broad range of defect types on all processing layers at high production throughputs. Utilized for systematic yield improvements and baseline defectivity reduction on memory and logic devices at the 55/45nm nodes and beyond, the 281x brightfield defect inspectors serve as a critical component of a fab's yield management strategy.
Applications CMP: The 281x brightfield defect inspectors detect critical CMP defects such as small voids, helping to reduce yield loss in the CMP process module at all stages of the yield ramp. Etch: The 281x wafer defect inspectors are used for critical etch line monitoring applications, capturing line thinning, small bridges, protrusions and other yield-limiting etch defect types. Photo: The 2810 and 2815 brightfield patterned wafer inspectors help engineers solve the yield issues associated with traditional or immersion lithography by photo-cell monitoring (PCM) or after-develop inspection (ADI). PWQ: The Process Window Qualification (PWQ) application identifies printed reticle design errors, enabling lithographers to qualify the process window for their sub-45nm designs prior to production. Related Information
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