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LMS IPRO4
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Advanced Reticle Pattern Placement Metrology
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Product Description

The LMS IPRO4 is a fully-automated mask metrology system capable of measuring pattern placements on masks to support mask metrology requirements for the 45nm node production and 32nm node development. This mask metrology system monitors and maintains mask makers’ lithography tool performance and provides best precision for absolute pattern placement on reticles. This mask metrology system demonstrates field-proven 1nm measurement performance on any standard reticle and on NIL templates and early EUV masks. Measurement accuracy improved by 25% compared to earlier generation systems.
 
  • Sophisticated measurement algorithms enable reliable measurement performance on all reticles
  • The off-line data evaluation (DEVA) software allows the evaluation of pairs of masks intended for use in double patterning technology for the 32nm node
  • The utilization of the mask metrology system is optimized by remote access and control capability including remote job set-up and data evaluation, and full remote operation of the system
  • The environmental control chamber provides temperature stability in the milli-Kelvin range providing stable measurement conditions

Applications
Pattern placement measurement on reticles

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