Product Description

ProBEAM is a 3-D electron beam lithography optimization tool that saves you time and money by enabling you to investigate complex issues relating to mask making, direct write e-beam lithography, and projection e-beam lithography. ProBEAM electron beam lithography optimization tool combines advanced Monte Carlo e-beam scattering algorithms, versatile imaging capabilities, and the industry's best-tested resist models to produce the most accurate and easy-to-use e-beam lithography simulator available.

• Quickly delivers electron beam lithography process optimization information--in minutes versus days
• Accurately explores the effects of the electron beam lithography process variables
• Cost-effectively investigates the electron beam lithography process performance improvements
• Accurately models electron beam lithography processes up to 100keV

Applications

• Film stack and resist thickness optimization
• Electron beam lithography process
• Write strategy optimization
• Proximity effect investigation
• Beam voltage Impact
• Programming interface

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ProBEAM Product Overview
Lithography Glossary, written by Chris Mack