LithoWare is a Linux-based lithography performance optimization tool that enables engineers to begin their OPC/RET development without the need to wait for a mature silicon process. LithoWare lithography performance optimization tool shares the rigorous lithography engine with PROLITH, which is traditionally used by R&D and process engineers on Windows PC. LithoWare lithography performance optimization tool also dramatically reduces the time and cost to develop RET and OPC recipes. This lithography performance optimization tool operates on a Linux cluster and allows distributed computing for problems of a large scale. This lithography performance optimization tool targets EDA users (OPC and RET engineers) who want to integrate with other Linux-based applications.

• OPC and process co-optimization reduces process and OPC development time and effort
• Resist process predictions to understand real lithography performance and enable more-optimum process and OPC selection.
• Distributed computing enables faster runtime
• Integrating seamlessly into your EDA workflow, complementing existing tools
• Increases your experimental coverage and reduces your turn around time with no re-calibration between process conditions

Application

• Lithography and etch