Spectra Critical Dimension (SCD) is a non-destructive metrology method that measures grating and contact geometries using Spectroscopic Ellipsometry. By means of modeling the profile is created and a spectra produced. Each parameter variation is placed in a library. By means of matching the measurement with the model in the Library SCD can measure the profile. SCD also contain modeling software that will monitor contacts, use a variety of ways of making the measurement such as CDx which uses a calculation method the can use a limited library called a seed library. The SCD class covers SE theory, OLSA software, Spectra Suite including Analyzer and Creator, Basic Lithography and Etch process and Modeling profile. The SCD100 with 3.0 s/w release is also covered.

• Audience - Applications and Process Engineers, Operators
• Prerequisite - None
• Length - 5 days
  

Objectives

Upon completion student will be able to:

• Review basic F5/summit software operation.
• Review OLSA software
• Apply OLSA software to film optimization as applied to SCD
• Receive and over view of lithography and etch and how SCD is applied
• Create models and libraries for profiles for gratings using Spectra Creator software
• Confirm coarse libraries using Spectral Analyzer
• Apply variations of CDX to determination of profiles of contact and gratings
• Receive a general overview of Networking for the SCD system and the tool.