The goal of this course is to give customers the skills and knowledge necessary to operate and maintain tool functionality of the SP2 unpatterned wafer inspection tool.

• Audience - Operators, Equipment and Maintenance Engineers
• Prerequisite - none
• Length - 5 days
  

Objectives

Upon completion of this course, student will be able to:

• Explain the basic principles of light scattering
• Demonstrate recipe optimization techniques
• Understand SFS product line and its specifications
• Build and optimize a recipe for a given unpatterned process modules (i.e. Bare Si, Film, Rough Films, etc.)
• Demonstrate tool operations and interpreting scan results
• Demonstrate competent tool usage and wafer handling techniques
• Show proficiency on course concepts and objectives by completing a comprehensive, open-book assessment with a minimum score of 80%