Metrology

Integrated Circuit

Quantox XP
In-line, Real-Time Electrical Monitoring and Characterization

Product Description

  • Enables technology for advanced gate formation for sub-130 nm devices
  • In-line, real-time electrical testing for a prediction of transistor performance accelerates time to market for advanced ICs
  • Controls advanced gate dielectric processes at 130 nm and below nodes
  • Provides better than 95 percent correlation to device electrical test data
  • ACTIV™ technology features highly accurate, comprehensive data on physical and electrical properties of advanced gate dielectric materials
  • Allows non-contact electrical test measurements of key transistor gate parameters
Quantox XP offers a complete gate monitoring solution for today's advanced gate dielectric processes. ACTIV technology enables independent non-contact electrical test measurements of gate capacitance and leakage for in-line electrical process control. Quantox XP features production-proven tool-to-tool stability, best in class performance for long-term tool matching, and 300 mm production worthiness. This tool fully supports 300 mm factory automation.

Comprehensive Films Metrology Control
Quantox XP (in-line, real-time electrical monitoring and characterization), RS-100 (resistivity metrology), SpectraFx 100 (advanced thin film measurement) and ASET-F5x (thin film measurement) provide comprehensive films metrology control using optical and electrical topography measurements.

Application

Advanced Gate Process Control: ACTIV technology enables process control of the latest gate dielectric films. The system provides precise non-contact measurements of equivalent gate oxide thickness, dielectric charge composition, interface quality, and soft electrical breakdown for sub-20

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