Metrology

Integrated Circuit

Quantox XP
In-line, Real-Time Electrical Monitoring and Characterization

Product Description

  • Enables technology for advanced gate formation for sub-130 nm devices
  • In-line, real-time prediction of transistor performance accelerates time to market for advanced ICs
  • Controls advanced gate dielectric processes at 130 nm and below nodes
  • Provides better than 95 percent correlation to device electrical test data
  • ACTIV™ technology features highly accurate, comprehensive data on physical and electrical properties of advanced gate dielectric materials
  • Allows non-contact electrical measurements of key transistor gate parameters

Quantox XP offers a complete gate monitoring solution for today's advanced gate dielectric processes. ACTIV technology enables independent measurements of gate capacitance and leakage for in-line electrical process control. Quantox XP features production-proven tool-to-tool stability, best in class performance for long-term tool matching, and 300 mm production worthiness. This tool fully supports 300 mm factory automation.

Comprehensive Films Metrology Control
Quantox XP (in-line, real-time electrical monitoring and characterization), RS-100 (resistivity metrology), SpectraFx 100 (advanced thin film measurement) and ASET-F5x (thin film measurement) provide comprehensive films metrology control using optical and electrical topography measurements.

Application

Advanced Gate Process Control: ACTIV technology enables process control of the latest gate dielectric films. The system provides precise measurements of equivalent oxide thickness, dielectric charge composition, interface quality, and soft electrical breakdown for sub-20

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