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Production Thin Film Measurement System
Product Description
In the semiconductor manufacturing environment, precise control over the deposition, patterning, etching, and polishing of metal and dielectric films is vital in meeting quality objectives. At the same time, shrinking device geometries continue to drive the need for advanced materials research.
The Prometrix ® UV-1280SE system provides the capabilities to meet these requirements, combining dual-beam spectrophotometry and broadband spectroscopic ellipsometry into a single-solution, production-proven thin film measurement tool. The combination of the two technologies allows the system to directly measure film thickness, refractive index (RI), and extinction coefficient of single- and multi-layer thin film stacks simultaneously and without referencing.
The UV-1280SE does it all simply and quickly, while lowering cost of ownership and increasing system-to-system matching. The system offers powerful, easy-to-use Windows NT ® software, new algorithms for next-generation applications, and a dual-finger robot for increased production efficiency. These unique capabilities allow the UV-1280SE to expand its utility in both process control and advanced materials development, reducing manufacturing costs while speeding time to market.
For complete information, download the overview below.
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