Product Description

Computational Lithography

Advanced IC manufacturers, stepper companies, track companies, and material providers use PROLITH to optimize critical-feature designs, manufacturability and process-limited yield faster and more reliably than with any other computational lithography product. PROLITH version 12 extends the industry's leading lithography optimization tool to include advanced features that predict the effects of EUV lithography. As a critically important Computational Lithography product for the industry, PROLITH helps customers accelerate designs into production, rapidly implement new processes and technologies, and maximize yield.

• Use the newest capabilities in PROLITH 12 to identify EUV equipment, mask and materials performance tradeoffs.
• Access the only source of expertly calibrated resist models for the latest photoresists.
• Explore the effects of processes, materials, and tools on lithography results over a wide range of technologies including immersion lithography, double-patterning with embedded wafer topography, and EUV.
• Receive lithography process optimization information now, speeding process development.
• Optimize process windows quickly and cost-effectively.

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PROLITH is a key product in KLA-Tencor's portfolio of lithography optimization technologies. KLA-Tencor isthe world's leading provider of comprehensive yield acceleration solutions, helping customers optimize lithography performance quickly and accurately. ProDATA works with PROLITH to deliver faster lithography optimization.

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• PROLITH Technical Papers