Metrology

Integrated Circuit

Archer 100
Overlay Metrology with Angstrom-level Precision

Product Description

The Archer 100 optical overlay control system meets the stringent performance and cost-of-ownership (CoO) requirements for the most advanced design rules and immersion lithography. This fully extendible system satisfies today's tighter overlay budgets yet is designed to keep pace with increasingly challenging lithography control needs.

  • Lower total measurement uncertainty (TMU) satisfies tighter overlay error budgets with improved precision
  • Improved tool utilization and CoO increases total tool productivity over previous generation overlay systems
  • Extendible platform addresses current immersion lithography technology challenges, plus next generation double patterning lithography
  • Automatic Recipe Optimization enables automatic recipe creation offline, minimizing human error and freeing up valuable fab resources

Application 

Low-Contrast Measurements: The Archer 100 effectively solves the problem of lower contrast measurements, increasingly seen in such applications as amorphous carbon layer (aCL) hard mask films. A new illumination system option improves measurement accuracy and robustness for 45nm and below overlay error budgets in HVM memory production.

Bright Field Critical Dimension (BF CD): The BF CD measurement calculates the distance between one feature and another. BF CD measurements can be horizontal or vertical, with their specific direction determined by the orientation of the measured feature. Using the Archer 100, the BF CD capability can also be effectively applied for measuring "Fuse Box" structures with high topography.

Immersion Lithography: The industry leading specifications of the Archer 100 platform increase the overall equipment effectiveness of lithography cell tools. The tool reliably and accurately measures exact process conditions at increased sampling rates, needed for better stepper matching and lithography process control in today's emerging immersion lithography applications. The Archer 100 platform is designed with the flexibility and extendibility to meet the 32nm requirements of R&D fabs, including next-generation strategies such as double patterning lithography (DPL).

Contact Me >

Related Information