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Critical Dimension Scanning Electron Microscope (CD SEM)
Product Description
As device geometries shrink to smaller design rules, the speed and precision of automated critical dimension (CD) measurements become more crucial in competitive semiconductor manufacturing environments. Precise control of feature linewidths enables optimum device performance and maximum economic yield. State-of-the-art CD SEMs are necessary to provide the quick feedback required for effective lithography and etch process control.
The KLA-Tencor 8100XP CD SEM has the unique capabilities required to meet today's advanced metrology requirements. Production-proven electron optics provide superior imaging and precision measurements at the bottom of very high aspect ratio device features. With high-speed automation and networking, the 8100XP can help with productivity and system utilization.
Advanced productivity
The KLA-Tencor 8100XP provides several productivity-enhancing features including high throughput, seamless networking, off-line recipe setup, and full system automation.
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