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Lithography GlossaryWritten by Chris Mack A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z
�hler Illumination A method of illuminating the mask in a projection imaging system whereby a condenser lens forms an image of the illumination source at the entrance pupil of the objective lens, and the mask is at the exit pupil of the condenser lens. Example: The use of K�hler illumination has become standard in projection lithography due to its superior uniformity. KrF Example: KrF exposure tools have been the most popular lithographic tools since the 250nm resolution node. A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z
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