|RAPID IC Fab Series|
Reticle Defect Inspection Systems for IC Fab Applications
The Teron™ SL650 reticle defect inspection system provides advanced technologies to support IC fabs’ reticle monitoring requirements for the 20nm design node and beyond. With 193nm illumination and STARlight™ technologies, the Teron SL650 produces the sensitivity required to monitor reticle degradation and detect yield-critical reticle defects, such as haze growth defects or contamination in patterned and open areas. The Teron SL650 reticle defect inspection system also has industry-leading throughput, supporting the fast cycle times needed to qualify the increased number of reticles associated with multi-patterning techniques and advanced IC design nodes. Used to assess incoming reticle quality and to re-qualify reticles during production use and after reticle cleaning, the Teron SL650 reticle defect inspection system helps chipmakers protect yield by reducing the risk of printing defective wafers.
Reticle Re-Qualification: High sensitivity defect inspections are needed for early detection of haze defects and other progressive defects that occur unpredictably in the fab. Because these haze defects and other reticle defects threaten the yield of every subsequent wafer printed, capturing the reticle defects before they are printed on the wafer is the best means of protecting yield. After the reticle has been used to print many wafers, or after it has been cleaned, it is inspected to re-qualify it for the production line. In addition to defect inspection, the Teron SL650 reticle defect inspection system can monitor reticle degradation over time using STARlightMaps™ technology. By providing early detection of reticle variations that can affect the pattern printing quality and narrow the process window, STARlightMaps™ helps IC fabs maintain device yield, performance and reliability.
Incoming Quality Check: The Teron SL650 reticle defect inspection system can be used to verify that reticles delivered to the IC fab meet strict quality specifications and to check for defects added to the reticle during shipment. In addition, the Teron SL650 produces the reticle inspection data necessary to benchmark vendors or support a routine quality-control program.
X5.2: Reticle inspection system for non-critical reticles or reticle sets for ≥20nm design node IC technologies. The X5.2 reticle inspectors are available as a new system or as a field upgrade to existing TeraFab models.