The KLA-Tencor INM100 IR Defect Inspection Microscope uses infrared light to visualize defects and failures within semiconductor wafers or other Si-like substrate materials which cannot be detected using standard optical methods.

Applications include defect review of the first metallization layer from the back side of the wafer and sub-surface review of shorts contact/bridge defects, inclusion tracing, MEMS device/cavity seal inspections, as well as alignment offset measurements for wafer-level packaging.

• Infrared inspection wavelength range: 1050-1550nm
• Simultaneous IR review in transmission and/or reflected light
• Si-corrected high magnification objective is adjustable for different material thicknesses and provides crisp and high contrast images
• Alternate VIS and IR imaging in one microscope
• Imaging methods in IR and VIS: brightfield, darkfield, DIC
• Full range of objectives for visual light, and dedicated IR objectives with effective magnifications from 2.5x up to 100x
• Eight-inch manual stage for fast sample positioning with optionally available coordinate display

Contact our authorized sales representatives in the United States, Asia or Europe and the Middle East , or send an email inquiry to our support team.

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