e-Beam Wafer Defect Review and defect Classification System
The eDRTM-7100 electron-beam (e-beam) review and defect classification system accurately identifies and sources high resolution images of wafer defects. Utilizing fourth-generation e-beam immersion optics, the eDR-7100 defect review and defect classification system delivers the performance required to re-locate, image and classify yield-critical defects for leading-edge design nodes, with a particular benefit for imaging defects at the bottom of complex 3D structures, such as FinFETs. The eDR-7100 defect review and defect classification system also features improved throughput, enabling increased defect sampling for a more accurate defect Pareto, accelerated defect sourcing, and faster time to resolve yield issues. Defect classification technology is supported through offline defect classification capability, automated defect binning with inline Defect Organizer (iDO), and enhanced energy-dispersive x-ray (EDX) composition analysis. In addition to accurately identifying defects detected by the most advanced wafer defect inspection systems, the eDR-7100 defect review and defect classification system features several innovative applications that address a broad range of fab use cases, including critical point inspection, process window qualification, reticle defect review technology, and optical patterned wafer inspection recipe optimization.
Defect Imaging: The smallest yield-relevant defects are beyond the resolution limits of optical microscopy; therefore electron-beam imaging technology is essential to capturing an image detailed enough for defect classification. Effective image capture on the e-beam review technology tool begins with reliable and efficient re-detection of the defect. The eDR-7100 defect classification system features high stage accuracy that increases the defect re-detection rate. In addition, the eDR-7100 defect classification system’s exceptional image quality is built upon fourth-generation immersion optics, an innovative collector configuration, and simultaneous top-down and topographic imaging. The eDR-7100 e-beam review and defect classification tool is capable of re-locating and imaging the most challenging defect types at advanced design nodes, including defects as small as 10nm or defects located at the bottom of a deep trench or hole. By resolving these challenging defect types, the eDR-7100 defect classification system produces defect Paretos with a much lower percentage of SEM non-visual defects and a higher percentage of defects of interest.
Defect Classification: Accurate defect classification is essential to accurately identifying the source of the defect and addressing the issue in a timely manner. In addition to providing the SEM sensitivity required to resolve yield-critical defects on advanced design node devices, the eDR-7100 defect classification system features high throughput, enabling increased review sampling for a more accurate representation of the defect population on the wafer. Offline defect classification capability allows engineers to classify defects from any computer in the fab or office while increasing the tool’s availability for imaging work. A new energy-dispersive x-ray (EDX) composition analysis subsystem further aids in defect classification. By providing better quality images and a higher quantity of review data, the eDR-7100 defect classification system delivers a more accurate defect Pareto, accelerating defect sourcing and yield.
Lithography Qualification: The eDR-7100 defect review and classification system can help map and monitor the process window in the lithography module, through full support of process window qualification (PWQ), focus-exposure matrix (FEM) and other standard techniques. The eDR-7100’s throughput enhancements and support of PWQ 3.0 produce significantly faster process window qualification per layer.
Inspector Recipe Optimization: Design-aware capability and the seamless connectivity between the eDR-7100 defect classification system and KLA-Tencor's optical patterned wafer inspectors reduce recipe set up time by ~50%; produce higher quality inspection recipes and results; and enable improved productivity.
Bare Wafer OQC / IQC: The automated bare wafer review solution provided by the eDR-7100 defect classification system utilizes a high sensitivity optical microscope for re-detection, high resolution SEM imaging, automated defect binning, and reliable energy-dispersive x-ray (EDX) capability. Furthermore, the sensitivity and throughput enhancements of the eDR-7100 defect classification system fully support the review needs of the Surfscan SP3 – providing fast and accurate defect imaging and classification of ≤20nm bare wafer defects. This auto bare wafer review solution is used for effective sourcing of monitor wafer defect issues during development and production for wafer manufacturers – and ensures incoming wafer quality at IC fabs.