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Error-free reticles are the first step in achieving high yields, since reticle defects can be replicated on production wafers. Both mask shops and IC fabs rely on high sensitivity reticle inspection and metrology systems to ensure that reticles are defect-free and meet mask metrology requirements.
Defect Inspection
- TeraScan: Photomask inspection systems to enable production of advanced-node reticles at mask shops including Wafer Plane InspectionTM (WPI) capabilities
- TeraFab: Photomask inspection systems allowing IC fabs to qualify incoming reticles and inspect production reticles for contaminants
- TeraStar: Photomask inspection system enabling mask shop production of reticles for larger design-rule devices
CD and Overlay Metrology
- LWM 9045: SEM-based Critical Dimension (CD) measurement system for reticles
- LMS IPRO4: Fully automated system capable of measuring reticle pattern placements
Data Management and Analysis
- 9Xi: Central data hub serving KLA-Tencor reticle inspection equipment
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