Product Description

LithoWare 2.0 is a Linux-based lithography optimization tool that enables engineers to begin their OPC/RET development without the need to wait for a mature silicon process. LithoWare shares the rigorous lithography engine with PROLITH, which is traditionally used by R&D and process engineers on Windows PC. LithoWare also dramatically reduces the time and cost to develop RET and OPC recipes. This tool operates on a Linux cluster and allows distributed computing for problems of a large scale. It targets EDA users (OPC and RET engineers) who want to integrate with other Linux-based applications.

•  OPC and process co-optimization reduces process and OPC development time and effort
• Resist process predictions to understand real lithography performance and enable more-optimum process and OPC selection.
• Distributed computing enables faster runtime
• Integrating seamlessly into your EDA workflow, complementing existing tools
• Increases your experimental coverage and reduces your turn around time with no re-calibration between process conditions

Application

• Lithography and etch

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