In Situ Process Monitoring
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SensArray Wafers

KLA-Tencor’s SensArray SensorWafers provide a unique way, not available from conventional wafer process monitoring equipment, to monitor the effect of the process environment on production wafers. Measurements, such as temperature and RF voltage, are used by both chipmakers and wafer process monitoring equipment manufacturers to visualize, diagnose, and control their processes and process tools.

Learn more by reading our SensArray Wafer Level Metrology overview document

THIN FILM DEPOSITION

  • HighTemp-350 : Extends temperature control for optimization of deposition processes.

Lithography

  • ScannerTemp: allows highly accurate temperature monitoring of dry and immersion lithography systems, whose overlay performance is highly sensitive to thermal variation.
  • SensArray 1840 Rev A: Instrumented wafers for real-time hot plate temperature measurements
  • SensArray 1850: Instrumented wafers for bake plate characterization
  • Integrated Wafer: Wireless, low profile wafer process monitoring system for gathering critical thermal data from semiconductor manufacturing processes
  • Base Station 300/300Z: Central operating hub for process monitoring and uploading thermal measurement survey requirements and downloading thermal survey data
  • iWafer Carrier Station: Communication link between the SensorWafer and host computer for process monitoring
  • LithoSuite: Data collection and analysis system for lithography applications
  • Thermal MAP: Wireless data acquisition hardware and graphical software for visualization and analysis
  • Thermal TRACK: PC-based PDA supplies real-time process monitoring and measurements

Plasma Etch

  • EtchTemp-SE (ET-SE) delivers temperature wafer process monitoring during silicon etch processes, providing precise condition temperature measurements with a higher signal-to-noise ratio than alternative methods.
  • EtchTemp: Instrumented SensorWafer for monitoring and characterizing high-power, high-frequency etch recipes for 65nm nodes and below
  • I3 Integral: SensorWafer for highly accurate measurement of plasma etch temperature
  • iWafer Carrier Station: Communication link between SensorWafer and host computer for process monitoring
  • PlasmaSuite: Data collection and analysis system for plasma applications

Implant and Wet

  • WetTemp-LP is designed to be compatible with both single wafer and batch wet clean systems that require this standard-thickness wafer form factor.
  • i3 Integral for Implant: Capture process environment effects on production wafers and obtain accurate temperature profiles with full wafer spatial resolution monitoring
  • I3 Integral for Wet: Instrumented wafer designed to provide critical wet processing temperature data
  • PlasmaSuite: Data collection and analysis system for plasma applications
  • Base Station 300/300Z: Central operating hub for process monitoring and uploading thermal measurement survey requirements and downloading thermal survey data
  • iWafer Carrier Station: Communication link between the SensorWafer and host computer for process monitoring

Instrumented Substrates

  • SensArray 1530: Instrumented wafer for cold wall, RTP, sputtering, CVD, plasma strippers and epitaxial reactors
  • SensArray 1535: Instrumented wafer for process temperature monitoring of hot wall systems, and oxidizing cold wall environments
  • SensArray 1630: Instrumented wafer for both front-end atmospheric and belt CVD systems, and in back-end wafer solder bumping reflow ovens
  • SensArray 1730: Instrumented wafer for photoresist track systems, temperature-controlled wafer chuck systems, oven applications, and resist bake, polyimide, and SOG applications
  • SensArray 20x0: Instrumented glass panels and tiles for monitoring and measuring temperature profiles for a range of flat panel processing applications
  • Thermal MAP: Wireless data acquisition hardware and graphical software for visualization and analysis
  • Thermal TRACK: PC-based PDA supplies real-time wafer process monitoring and measurements

 

 
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