Written by Chris Mack
Brought to you by the creators of PROLITH
A method of illuminating the mask in a projection imaging system whereby a condenser lens forms an image of the illumination source at the entrance pupil of the objective lens, and the mask is at the exit pupil of the condenser lens.
Example: The use of Kï¿½hler illumination has become standard in projection lithography due to its superior uniformity.
Krypton Fluoride, a type of excimer laser used in optical lithography that emits light at about 248nm.
Example: KrF exposure tools have been the most popular lithographic tools since the 250nm resolution node.